The Potential of Bentonite as a Low-cost Adsorbent for the Removal of Heavy Metal Ions from Multicomponent Aqueous Systems of the Galvanic Industry
Waste water in the galvanic process contains high concentrations of heavy metals that pose a direct danger to humans and the environment. Conventional methods for their removal are quite expensive and generate a large amount of waste. The development of new and improvement of existing methods for the removal of heavy metals from galvanic wastewater are the subject of many studies. Compared to other purification methods, the adsorption is becoming an increasingly popular method of wastewater purification, especially if the adsorbent is cheap, easily available and does not require any other treatment before use. Therefore, the aim of the work was to investigate the possibility of using natural bentonite for the removal of heavy metal ions from multi-component water systems of the galvanic industry. For this purpose, the physico-chemical characterization of natural bentonite was performed, and then the influence of pH value, time and temperature on the adsorption efficiency was examined. The results of adsorption showed that natural bentonite can be used as an adsorbent for the removal of heavy metal ions from waste galvanic waters, and that at pH 5 it achieves the maximum removal efficiency for Cu(II):Cr(III):Ni(II) ions in the percentage ratio 100 : 99.990 : 99.998. The results showed that the highest removal efficiency for Cu (II) ions was achieved in the first 10 minutes, and 20 minutes for Cr (III) and Ni (II) ions. The maximum efficiency of Cu (II) removal was achieved at all temperatures, while for Cr (III) 99.99% and Ni (II) 100% maximum efficiency was achieved at 35°C, which indicates that the adsorption process is endothermic. The experimental results of the adsorption of Cu (II) metal ions are in good agreement with the Langmuir and Freundlich theoretical models, while for Cr (III) and Ni (II) ions they are in better agreement with the Langmuir adsorption model.